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LITHOGRAPHY SUPPLIES

CPS power supplies for electron-beam lithography provide either four or five outputs, the various voltages of which differ depending on the customer's specific requirements.

Electron-beam lithography may be used to print features at resolutions below 10 nanometers. It is a slower and potentially higher-resolution process than other forms of nanolithography, and so it is particularly important for power sources to remain uniform over time. CPS' power supplies for lithography produce highly stable outputs with very low ripple and noise, as well as advanced arc and short protection.

PRODUCTS
Power Supplies

Model 1316 — Single output unipolar high voltage power supply

  • Single output +0.01 to +20 kV or −0.01 to −20 kV
  • Very low output ripple: under 200 mV peak-to-peak at full load and 30 kV at 1 mA (20 kV at 2 mA)
  • Temperature coefficient under 15 ppm/°C
  • Separate connections for HV output cable shield and programming reference
  • Overvoltage and overcurrent protection
  • Automatic output voltage recovery after arcs and short circuits
  • AC input
  • Local/remote programming and metering
  • Positive or negative polarity
Model 1316

Model 1966A — Five output high voltage power supply with accelerating focus

  • Five high voltage outputs
  • Decelerating focus voltage
  • Floating filament supply
  • Extremely low ripple and outstanding stability
  • Low line and load regulation of high voltage outputs
  • All outputs short circuit and arc protected
  • Computer controlled via parallel digital differential interface
  • Each high voltage output current and voltage limited
  • Very good cross regulation
  • Very low crosstalk ripple
  • Very low temperature coefficient
  • Standard 19-inch rack mounted chassis: 19" × 22.5" × 10.5"
  • Common applications include electron-beam lithography
Model 1966A

Model 1966D — Five output high voltage power supply with decelerating focus

  • Five high voltage outputs
  • Accelerating focus voltage
  • Floating filament supply
  • Extremely low ripple and outstanding stability
  • Low line and load regulation of high voltage outputs
  • All outputs short circuit and arc protected
  • Computer controlled via parallel digital differential interface
  • Each high voltage output current and voltage limited
  • Very good cross regulation
  • Very low crosstalk ripple
  • Very low temperature coefficient
  • Standard 19-inch rack mounted chassis: 19" × 22.5" × 10.5"
  • Common applications include electron-beam lithography
Model 1966D
 
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