| 0-30 kV, 1 mA, <200 mV ripple, 120/220 VAC input | |
| 0-30 kV, 1 mA, 200 mVpp, 20 ppm/C, 120 VAC | |
| Quad output, 25 kV anode, 5-8 kV focus, -150 V G1 grid, 200-800 V G2, 28 VDC input | |
| E-beam lithography, multiple-output, accel focus, with floating filament, 120/220 VAC input | |
| E-beam lithography, multiple-output, decel focus, with floating filament, 120/220 VAC input | |
| 13 to 30 kV at no load, 5 to 25 kV at 10 uA output, 108 to 132 VAC at .1 Amp max. | |
| 0-30 kV, 500 uA, 100 mV ripple, 25 ppm/C, low stored energy, 24 VDC input | |
| 0-35 kV, 500 uA, <200 mV ripple, 10 ppm/C, low stored energy, 24 VDC input, UL listed and CE marked at 30 kV, 100mA | |
| +/- 30 kV, output voltage polarity reversible, three HV output connectors | |
| 0-30 kV DC (full scale programmable), 500 uA rated (1 mA maximum) with external cooling, 22-30 VDC input. Available with analog or digital meters | |
| 0-30 kV, 500 uA beam, 0-5 A integrated floating filament supply, 120 VAC input | |
| 0~ (-)30 kV, 300 uA at -30kV | |
| 0-30 kV, 500 uA beam, 0-5 A integrated floating filament supply, 120 VAC input | |
| 0-30 kV, 500 uA beam, 1.5 kV focus, 0-5 A floating filament supply, 120 VAC input |